AIT DOE/Diffusei # testing equipment is mainly used to detect the diffraction performance parameters of wafer chip, and the regular diffraction image after laser diffraction through the chip
Application Area
Measurement of diffraction performance of chips in semiconductor field
Features and Advantages
High precision visual positioning to ensure the accuracy of chip inspection position
Adjustable imaging systems - Compatible with different types of chip detection
Self developed software algorithm with complete functions to meet different customer needs
Technical Parameters
Repetitive positioning accuracy 3um
UPH:2500-3500
Compatible with two different types of products: DOE and Diffuseri
Repeated detection data fluctuates within 5%
Maximum FOV of products supported for detection: 110
The high-precision positioning vision system calibrates the angle and position of the wafer to ensure that each chip on the wafr can be exactly above the light source during the detection process;
The height of light source in Z direction can be adjusted by motor to meet the distance requirements of different lasers or modules.